Semiconductors

💧 Accurate Flow Rate Control

Accuracy helps maintain the high quality and reliability of semiconductor devices, reducing defects and improving overall production efficiency.

🔁 Reliable Repeatability

Valveless piston pump technology ensures that each process, from etching to electroplating, is performed with the same precision every time. This reduces variability and enhances the overall quality and yield of semiconductor devices.

🌫️ Pressure Ranges for Different Applications

Semiconductor processes require a variety of pressures, ranging from low pressure for delicate tasks to high pressure for moving viscous fluids or performing critical cleaning and etching procedures.

🔧 Less Maintenance, Less Down Time

Ensures that semiconductor production lines run smoothly and efficiently, maximizing output and maintaining the stringent quality standards required in the industry.

Problem

Semiconductor manufacturing involves the use of extremely corrosive chemicals, such as phosphoric acid, hydrochloric acid, hydrofluoric acid, and peroxide. These chemicals can bloom and seep when exposed to air, posing significant challenges in maintaining a safe and efficient manufacturing process.

Solution

To address these challenges, Fluid Metering recommended the STF Fixed Dispense Pump with customized pump head materials. This chemically inert pump was designed with seals to prevent air from entering the pump head, thereby mitigating the risk of chemical exposure. Fluid Metering pumps are known for their accuracy and reliability making them ideal for various applications in semiconductor manufacturing, including deposition, etching, cleaning, dozing, sample delivery, and bath replenishment.

Copy Exactly! Manufacturing

Fluid Metering understands the importance of the Copy Exactly! methodology, ensuring precise replication of manufacturing processes across sites for consistent quality and performance. Partnering with us means you will work with expert engineers that will ensure your specific requirements are met.